Jonathan J Strahle

Title: Innovations of Jonathan J Strahle

Introduction

Jonathan J Strahle is a notable inventor based in San Francisco, CA. He has made significant contributions to the field of semiconductor processing, holding 2 patents that showcase his expertise and innovative spirit. His work is primarily associated with Applied Materials, Inc., a leading company in the semiconductor industry.

Latest Patents

Strahle's latest patents include advancements in semiconductor chamber components. One of his patents focuses on semiconductor chamber components with advanced dual layer nickel-containing coatings. This technology involves exemplary methods for coating a component of a semiconductor processing system, which includes forming a nickel-containing alloy on an exposed surface. The methods also involve forming plasma effluents of a fluorine-containing precursor and contacting the nickel-containing alloy with these plasma effluents to fluorinate a portion of the alloy, resulting in a nickel-and-fluorine-containing material.

Another significant patent by Strahle is related to semiconductor chamber components with advanced coating techniques. This technology encompasses systems and methods that include a chamber with various components such as a pedestal, a lid stack, a faceplate, an electrode, and a showerhead. The faceplate is supported by the lid stack and features multiple first apertures, while the showerhead is positioned between the faceplate and the pedestal, defining several second apertures. The components may include coatings of yttrium fluoride, yttrium oxyfluoride, or both, with a thickness greater than 10 μm.

Career Highlights

Throughout his career, Jonathan J Strahle has demonstrated a commitment to innovation in semiconductor technology. His work at Applied Materials, Inc. has positioned him as a key player in the development of advanced semiconductor processing systems. His patents reflect his dedication to improving the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

Strahle has collaborated with talented individuals in his field, including coworkers Laksheswar Kalita and Christopher L Beaudry. These collaborations have contributed to the successful development of his patented technologies.

Conclusion

Jonathan J Strahle is a distinguished inventor whose contributions to semiconductor processing have made a significant impact on the industry. His innovative patents and collaborative efforts highlight his expertise and commitment to advancing technology in this critical field.