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For the Inventor, By the Inventor

Portland, OR, United States of America

Jonathan H Orloff

This inventor holds 3 USPTO granted patents. Top assignee: Oregon Graduate Center. Active years: 1984-1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jonathan H Orloff. Retrieved from https://idiyas.com/inventor/jonathan-h-orloff-wnorkitm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 3

Forward Citations = 78(Granted Patents)


Company Filing History:

goldMedal3 out of 14 
 
Oregon Graduate Center
 patents

Years Active: 1984-1987

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3 patents (USPTO):Explore Patents
1. 4698129 - Focused ion beam micromachining of optical surfaces in materials (1987-10-06),
2. 4629898 - Electron and ion beam apparatus and passivation milling (1986-12-16),
3. 4426582 - Charged particle beam apparatus and method utilizing liquid metal field (1984-01-17),

Title: The Innovative Journey of Jonathan H Orloff

Introduction: Jonathan H Orloff is a renowned inventor based in Portland, Oregon, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Jonathan H Orloff holds several patents in the areas of renewable energy, artificial intelligence, and sustainable transportation, showcasing his commitment to creating a more sustainable future.

Career Highlights: With a background in engineering and a passion for problem-solving, Jonathan H Orloff has led numerous successful projects that have revolutionized industries and improved the lives of many.

Collaborations: Throughout his career, Jonathan H Orloff has collaborated with leading tech companies, research institutions, and universities to bring his innovative ideas to life, fostering a culture of creativity and collaboration in the field.

Conclusion: Jonathan H Orloff's dedication to innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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