This inventor holds 2 USPTO granted patents. Top assignee: The State University of New York. Active years: 2000-2003.
Location History:
- Clifton Park, NY (US) (2000)
- Fishkill, NY (US) (2003)
Company Filing History:
Years Active: 2000-2003
Title: Innovations by Jonathan Faltermeier
Introduction
Jonathan Faltermeier is an accomplished inventor based in Fishkill, NY (US). He has made significant contributions to the field of chemical vapor deposition, particularly in the development of aluminum coatings. With a total of 2 patents, his work is recognized for its innovative methodologies and applications.
Latest Patents
Faltermeier's latest patents include a "Methodology for in-situ doping of aluminum coatings." This patent describes a chemical vapor deposition process that allows for the preparation of conformal copper-doped aluminum coatings on substrates. The process involves generating a first flow of reactant vapor containing a copper source precursor, heating the substrate to form a copper seed layer, and subsequently generating a second flow of reactant vapor with an aluminum source precursor. The substrate is then heated to a temperature above 185°C to form a copper-doped aluminum film.
Another notable patent is titled "Conformal pure and doped aluminum coatings and a methodology." This invention relates to a process and apparatus for forming conformal aluminum coatings on patterned substrates. It utilizes low-temperature thermal and plasma-promoted chemical vapor deposition techniques to achieve superior coverage and complete aluminum fill in microelectronic device manufacturing. The process allows for the growth of aluminum films with smooth surface morphology and small grain size, essential for ultra-large-scale integration (ULSI) applications.
Career Highlights
Faltermeier is affiliated with the State University of New York, where he continues to advance research in his field. His work has contributed to the understanding and application of aluminum coatings in semiconductor devices, enhancing their performance and reliability.
Collaborations
Throughout his career, Faltermeier has collaborated with notable colleagues, including Alain E Kaloyeros and Andres Knorr. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Jonathan Faltermeier's contributions to the field of chemical vapor deposition and aluminum coatings demonstrate his commitment to innovation. His patents reflect a deep understanding of materials science and engineering, paving the way for advancements in microelectronics.