Needham, MA, United States of America

Jonathan D Styles


 

Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2011-2013

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3 patents (USPTO):Explore Patents

Title: Innovations by Jonathan D Styles

Introduction

Jonathan D Styles is an inventive mind based in Needham, MA (US). He has made significant contributions to the field of printing technology, particularly in the area of hat printing. With a total of 3 patents, his work showcases a blend of creativity and practicality.

Latest Patents

One of his notable inventions is the "Hat Pallet for Digital Image Printing." This device is designed for printers that print images onto hats, featuring a bottom plate and a top plate that can be closed over the bottom plate. The bottom plate includes a printing plate and a bill support, ensuring that the hat is securely held in place during the printing process. The top plate has an opening that exposes part of the printing plate, allowing for precise image placement on the cap of the hat.

Another significant patent is the "Hat Brim Protector and Shaper." Similar to his previous invention, this pallet is designed for printing images onto hats with a brim. It includes a bottom plate with a printing plate and a brim support, which holds the hat in the correct position for printing. The design ensures that both the cap and brim are adequately supported, facilitating high-quality image transfer.

Career Highlights

Throughout his career, Jonathan has worked with reputable companies such as Vistaprint Technologies Limited and Cimpress Schweiz GmbH. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in the printing industry.

Collaborations

Jonathan has collaborated with notable coworkers, including Barry M Parent and Barry Parent. These partnerships have likely enriched his work and led to further advancements in his inventions.

Conclusion

Jonathan D Styles is a talented inventor whose work in hat printing technology has resulted in multiple patents. His innovative designs demonstrate a commitment to enhancing the printing process for hats, making him a noteworthy figure in the field.

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