Jon William Turley

Title: Jon William Turley: Innovator in Chemical Mechanical Polishing Technology

Introduction

Jon William Turley is a notable inventor based in Conshohocken, PA (US). He has made significant contributions to the field of chemical mechanical polishing, which is essential in the manufacturing of semiconductor devices. His innovative approach has led to the development of a unique polishing pad that enhances the efficiency and effectiveness of the polishing process.

Latest Patents

Turley's most recent patent is titled "Chemical mechanical polishing pad having sealed window." This invention features a multilayer chemical mechanical polishing pad that includes a polishing layer with a polishing surface, a porous subpad layer, and a light transmissive window element. The design allows for improved adhesion between the layers without the need for a laminating adhesive, which is a significant advancement in the field. He holds 1 patent for this innovative technology.

Career Highlights

Jon William Turley is currently employed at Rohm and Haas Electronic Materials CMP Holdings, Inc. His work at this company has allowed him to focus on developing advanced materials and processes that are crucial for the semiconductor industry. His expertise in chemical mechanical polishing has positioned him as a key player in this specialized field.

Collaborations

Turley collaborates with various professionals in his field, including his coworker Darrell String. Their combined efforts contribute to the ongoing innovation and improvement of chemical mechanical polishing technologies.

Conclusion

Jon William Turley is a distinguished inventor whose work in chemical mechanical polishing technology has made a significant impact on the semiconductor industry. His innovative patent demonstrates his commitment to advancing manufacturing processes.