This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Dow Global Technolgoies LLC. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: JoLee M Dominowski: Innovator in Spin-on-Dielectric Compositions
Introduction
JoLee M Dominowski is a notable inventor based in Linwood, MI (US). He has made significant contributions to the field of materials science, particularly in the development of spin-on-dielectric compositions. His innovative work has led to the creation of a patent that addresses important aspects of dielectric materials.
Latest Patents
JoLee holds a patent for "Spin-on-dielectric compositions with coating enhancer." This invention comprises a composition that includes (a) an oligomer or polymer dispersible in an organic solvent, which has a low dielectric constant or can be cured to form a material with a low dielectric constant, (b) at least one organic solvent, and (c) less than 1000 parts by weight of a polymeric coating additive per million parts by weight of the total composition (ppm). The polymeric additive is characterized by its miscibility with component (a) and the solvent system, but it becomes incompatible with the mixture of component (a) and solvent during the coating process.
Career Highlights
JoLee is currently associated with Dow Global Technologies LLC, where he continues to innovate and contribute to advancements in material technologies. His work is pivotal in enhancing the performance and application of dielectric materials in various industries.
Collaborations
JoLee has collaborated with notable colleagues, including Stephen F Hahn and Lynne K Mills, who have contributed to his research and development efforts.
Conclusion
JoLee M Dominowski's contributions to the field of spin-on-dielectric compositions exemplify the impact of innovative thinking in materials science. His patent reflects a significant advancement that could influence future applications in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
