Valbonne, France

Johnny Chung Nin U

This inventor holds 1 USPTO granted patent. Top assignee: Rohm and Haas Company. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Johnny Chung Nin U. Retrieved from https://idiyas.com/inventor/johnny-chung-nin-u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 112(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Johnny Chung Nin U: Innovator in Nonwoven Technology

Introduction

Johnny Chung Nin U is a notable inventor based in Valbonne, France. He has made significant contributions to the field of nonwoven materials, particularly through his innovative approach to formaldehyde-free compositions.

Latest Patents

Johnny holds a patent for "Formaldehyde-free compositions for nonwovens." This invention presents a curable composition that is useful for binding nonwovens without the harmful effects of formaldehyde. His work in this area reflects a commitment to developing safer and more sustainable materials.

Career Highlights

Johnny is associated with Rohm and Haas Company, where he has been instrumental in advancing research and development in nonwoven technologies. His expertise and innovative mindset have contributed to the company's reputation as a leader in the industry.

Collaborations

Johnny has collaborated with Charles Thomas Arkens, working together to enhance the development of nonwoven materials. Their partnership has fostered a creative environment that encourages innovation and the exploration of new ideas.

Conclusion

Johnny Chung Nin U's contributions to nonwoven technology through his formaldehyde-free compositions highlight his role as an important inventor in the field. His work not only advances material science but also promotes safer alternatives in manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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