Johnny B Covington

Title: Johnny B Covington: Innovator in Plasma Developable Negative Resist Compositions

Introduction

Johnny B Covington is a notable inventor based in Richardson, TX (US). He has made significant contributions to the field of materials science, particularly in the development of resist compositions used in advanced lithography techniques. His innovative work has led to the granting of a patent that showcases his expertise and creativity.

Latest Patents

Johnny B Covington holds a patent for "Plasma developable negative resist compositions for electron beam, X-ray." This negative resist composition includes a polymeric matrix material, a polymerizable monomer, and an onium salt radiation-sensitive initiator. The monomer is polymerized by irradiating the resist with an e-beam, X-ray, or ultraviolet source and heating the exposed resist. The resist is developed by a dry etchant such as plasma or a reactive ion etchant. This invention represents a significant advancement in the field of lithography, enabling more precise and efficient manufacturing processes.

Career Highlights

Johnny B Covington is currently employed at Texas Instruments Corporation, where he continues to push the boundaries of innovation in technology. His work at Texas Instruments has allowed him to collaborate with some of the brightest minds in the industry, contributing to the company's reputation for excellence in electronic components and systems.

Collaborations

Some of his notable coworkers include Jing S Shu and Wei William Lee. Their collaborative efforts have further enhanced the research and development initiatives at Texas Instruments, fostering an environment of innovation and creativity.

Conclusion

Johnny B Covington's contributions to the field of resist compositions exemplify the spirit of innovation that drives technological advancement. His patent and ongoing work at Texas Instruments Corporation highlight his role as a key player in the industry.