This inventor holds 1 USPTO granted patent. Top assignee: Delco Electronics Corporation. Active years: 1999.
Company Filing History:
Years Active: 1999
Title: The Innovative Contributions of Johnna Lee Haller
Introduction
Johnna Lee Haller is a notable inventor based in Noblesville, IN (US). She has made significant contributions to the field of silicon wafer processing, particularly in the area of bulk micromachining. Her innovative approach has led to advancements that enhance the efficiency and effectiveness of silicon wafer etching processes.
Latest Patents
Haller holds a patent for a method of protecting silicon wafers during wet chemical etching. This process involves applying a protective film on one or more surfaces of the silicon wafer to safeguard metallization and circuitry during the bulk micromachining process. The protective film used is divinylsiloxane bisbenzocyclobutene (BCB), which is highly resistant to various wet chemical etchants and maintains its resistance at elevated temperatures. The degree of curing of this material prior to etching is tailored to enhance its resistance to the etchant and improve its adhesion to the silicon wafer.
Career Highlights
Johnna Lee Haller is currently employed at Delco Electronics Corporation, where she continues to innovate and contribute to advancements in technology. Her work has been instrumental in developing processes that improve the reliability and performance of silicon-based devices.
Collaborations
Throughout her career, Haller has collaborated with notable colleagues such as Joseph Keith Folsom and Dan Wesley Chilcott. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the field.
Conclusion
Johnna Lee Haller's contributions to the field of silicon wafer processing exemplify the impact of innovative thinking in technology. Her patented methods and collaborative efforts continue to influence advancements in the industry.