This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1994.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1994
Title: Innovations of Johnannes L Bakx
Introduction
Johnannes L Bakx is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of optical recording devices. His innovative work has led to the development of a patented technology that enhances the efficiency of recording signals.
Latest Patents
One of Bakx's key patents is an optical recording device wherein the recording beam intensity is set. This invention allows for the recording of information signals in digital form as recording areas and intermediate areas. The technology determines an optimum write beam intensity, which is crucial for achieving high-quality recordings. The recorded pattern is read, and the read-out signal is analyzed to derive an analysis signal indicative of the deviation of the DC component of the read signal from an optimum level. This level is defined by the duty cycle of the information signal, ensuring that the average ratio of the lengths of the recording areas to the intermediate areas corresponds to the duty cycle of the information signal. The write beam intensity is then adjusted to minimize any deviation.
Career Highlights
Johnannes L Bakx has been associated with U.S. Philips Corporation, where he has contributed to various projects and innovations in optical technology. His work has been instrumental in advancing the capabilities of optical recording devices.
Collaborations
Bakx has collaborated with fellow inventor Johannes G Kablau, working together on projects that push the boundaries of optical recording technology.
Conclusion
Johnannes L Bakx's contributions to the field of optical recording devices demonstrate his innovative spirit and commitment to advancing technology. His patented inventions continue to influence the industry and pave the way for future developments.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
