Heverlee, Belgium

John Zabolitsky

This inventor holds 1 USPTO granted patent. Top assignee: Icos Vision Systems Nv. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John Zabolitsky. Retrieved from https://idiyas.com/inventor/john-zabolitsky

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: The Innovations of John Zabolitsky

Introduction

John Zabolitsky is a notable inventor based in Heverlee, Belgium. He has made significant contributions to the field of electronic components through his innovative methods and apparatuses. His work focuses on enhancing the precision of measuring positions of contact elements in electronic devices.

Latest Patents

Zabolitsky holds a patent for a "Method and an apparatus for measuring positions of contact elements of an electronic component." This invention involves creating a first and a second light path using two light beams with different viewing angles. The method allows for selective opening of both light paths, which converge into the image plane of a single camera. The positions of the contact elements are determined by analyzing the images produced by the two light beams.

Career Highlights

John Zabolitsky is associated with Icos Vision Systems NV, a company known for its advancements in vision systems technology. His work at the company has been instrumental in developing innovative solutions for electronic component measurement.

Collaborations

Zabolitsky has collaborated with notable colleagues such as Carl Smets and Karel Van Gils. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

John Zabolitsky's contributions to the field of electronic components through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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