Mead, CO, United States of America

John William Neuschaefer

This inventor holds 1 USPTO granted patent. Top assignee: Radian International LLC. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John William Neuschaefer. Retrieved from https://idiyas.com/inventor/john-william-neuschaefer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: John William Neuschaefer: Innovator in Radar Technology

Introduction

John William Neuschaefer is a notable inventor based in Mead, Colorado. He has made significant contributions to the field of radar technology, particularly with his innovative designs that enhance radar systems. His work is characterized by a commitment to advancing the capabilities of pulsed radar systems.

Latest Patents

Neuschaefer holds a patent for a "Digitally-controlled pulse shaper for pulsed radar systems and radar." This invention showcases his expertise in developing technologies that improve the performance and efficiency of radar systems. He has 1 patent to his name, reflecting his innovative contributions to the field.

Career Highlights

Throughout his career, Neuschaefer has worked with Radian International LLC, a company known for its focus on advanced radar technologies. His role at the company has allowed him to apply his inventive skills in a practical setting, contributing to various projects that push the boundaries of radar technology.

Collaborations

Neuschaefer has collaborated with talented individuals such as David A. Vik and K. Russell Peterman. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

John William Neuschaefer is a distinguished inventor whose work in radar technology has made a lasting impact. His patent and collaborations highlight his dedication to advancing the field, making him a key figure in the innovation landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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