Pleasant Hill, CA, United States of America

John Wade Viatella


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations of John Wade Viatella

Introduction

John Wade Viatella is an accomplished inventor based in Pleasant Hill, CA. He has made significant contributions to the field of X-ray scatterometry, particularly through his innovative patent that addresses challenges in measurement techniques.

Latest Patents

John Wade Viatella holds a patent for a "Beam shaping slit for small spot size transmission small angle X-ray scatterometry." This invention describes methods and systems aimed at reducing the effects of finite source size on illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements. The patent outlines a beam shaping slit with a slender profile, strategically positioned close to the specimen under measurement, ensuring it does not interfere with wafer stage components across a full range of beam incidence angles. Notably, the design incorporates four independently actuated beam shaping slits that effectively block portions of an incoming X-ray beam, generating an output beam with a box-shaped illumination cross-section. Each beam shaping slit is positioned at varying distances from the specimen along the beam axis, and they can rotate in coordination with the specimen's orientation.

Career Highlights

John Wade Viatella is associated with Kla Tencor Corporation, where he has been instrumental in advancing technologies related to X-ray measurements. His work has contributed to enhancing the precision and efficiency of scatterometry techniques, which are vital in semiconductor manufacturing and materials science.

Collaborations

John has collaborated with notable colleagues, including Alexander Bykanov and Nikolay Artemiev, who have worked alongside him in various projects at Kla Tencor Corporation.

Conclusion

John Wade Viatella's innovative contributions to X-ray scatterometry exemplify the impact of dedicated inventors in advancing technology. His patent reflects a commitment to improving measurement techniques, showcasing the importance of innovation in the field.

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