Company Filing History:
Years Active: 2005
Title: Innovations of John W. Schaller in Semiconductor Technology
Introduction
John W. Schaller is a notable inventor based in Morgan Hill, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of high-density RAM capacitors. His innovative approaches have led to advancements that enhance the performance and efficiency of electronic devices.
Latest Patents
John W. Schaller holds a patent for "Masking methods and etching sequences for patterning electrodes of high density RAM capacitors." This patent describes a method of etching a noble metal electrode layer disposed on a substrate to produce a semiconductor device. The device includes a plurality of electrodes separated by a distance equal to or less than about 0.35 μm and having a noble metal profile equal to or greater than about 80°. The method involves heating the substrate to a temperature greater than about 150° C. and etching the noble metal electrode layer using a high-density inductively coupled plasma of an etchant gas. The etchant gas comprises a selection from nitrogen, oxygen, halogens (e.g., chlorine), argon, and mixtures of BCl, HBr, and SiCl. This innovative method provides effective masking techniques and etching sequences for patterning high-density RAM capacitors.
Career Highlights
John W. Schaller is associated with Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to contribute to cutting-edge technologies that drive advancements in electronic manufacturing. His expertise in etching methods has positioned him as a valuable asset in the field.
Collaborations
Throughout his career, John has collaborated with notable colleagues, including Jeng H. Hwang and Steve S. Y. Mak. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in semiconductor manufacturing.
Conclusion
John W. Schaller's contributions to semiconductor technology, particularly through his patent on masking methods and etching sequences, highlight his role as an influential inventor in the industry. His work continues to impact the development of high-density RAM capacitors, showcasing the importance of innovation in technology.