Topsfield, MA, United States of America

John W Ryan

This inventor holds 2 USPTO granted patents. Top assignee: Extrusion Dies, Inc.. Active years: 1997-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John W Ryan. Retrieved from https://idiyas.com/inventor/john-w-ryan-nxxaccjb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 1997-1999

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2 patents (USPTO):Explore Patents

Title: The Inventive Mind of John W Ryan

Introduction: John W Ryan, a talented inventor based in Topsfield, MA, is making waves in the field of extrusion apparatus with his innovative creations. With two patents to his name and a creative spirit, Ryan is a force to be reckoned with in the world of inventions.

Latest Patents:

1. Dual Flexible Lip Extrusion Apparatus: Ryan's latest patent showcases an extrusion apparatus that features first and second die body portions with flexible lips, allowing for precise adjustments to the die outlet. This cutting-edge design enhances efficiency and accuracy in the extrusion process.

Career Highlights: John W Ryan is a valuable member of Extrusion Dies, Inc., where his inventive prowess shines through in every project he undertakes. His dedication to pushing the boundaries of extrusion technology has earned him recognition as a leader in the industry.

Collaborations: Ryan collaborates closely with esteemed coworkers Vernon J Krupa and Gregory M Wilson at Extrusion Dies, Inc. Together, they form a dynamic team that consistently delivers groundbreaking solutions in extrusion technology.

Conclusion: In conclusion, John W Ryan's passion for innovation and his remarkable talent as an inventor have positioned him as a key player in advancing extrusion technology. With a bright future ahead, Ryan continues to impress with his inventive creations and unwavering commitment to excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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