John W Benko

Title: John W Benko: Innovator in MOCVD Technology

Introduction

John W Benko is a notable inventor based in Trenton, NJ (US). He has made significant contributions to the field of materials science, particularly in the development of methods and apparatus for Metal-Organic Chemical Vapor Deposition (MOCVD). With a total of 5 patents to his name, Benko's work has had a lasting impact on the industry.

Latest Patents

One of Benko's latest patents involves an innovative MOCVD reactor design. In this reactor, gases are channeled around the periphery of a baffle plate, allowing them to flow radially inward along a slotted injection plate. The slots in the injection plate are of non-uniform width, which compensates for a non-uniform rate of deposition. This design results in a more uniform deposit of epitaxially grown material over a rotating heated substrate.

Career Highlights

Throughout his career, John W Benko has worked with prestigious organizations such as AT&T Bell Laboratories and American Telephone and Telegraph Company. His experience in these companies has provided him with a solid foundation in research and development, enabling him to innovate in the field of MOCVD technology.

Collaborations

Benko has collaborated with several notable individuals in his field, including Alexander Coucoulas and Jerome Levkoff. These collaborations have likely contributed to the advancement of his research and the successful development of his patents.

Conclusion

John W Benko is a distinguished inventor whose work in MOCVD technology has paved the way for advancements in materials science. His innovative approaches and collaborations have significantly influenced the industry, making him a key figure in the field.