Company Filing History:
Years Active: 2020
Title: Innovations by John Vu Nguyen
Introduction
John Vu Nguyen is a notable inventor based in Chadds Ford, PA (US). He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on improving the efficiency and effectiveness of wafer polishing methods.
Latest Patents
One of his latest patents is the "High-rate CMP polishing method." This invention provides a method for polishing or planarizing a wafer of semiconductor, optical, and magnetic substrates. The method involves rotating a polishing pad with radial feeder grooves that separate the polishing layer into distinct polishing regions. The grooves include a series of biased grooves that connect adjacent radial feeder grooves, enhancing the polishing process. By pressing and rotating the wafer against the polishing pad for multiple rotations, the removal rate of the wafer is significantly increased.
Another notable patent is the "Trapezoidal CMP groove pattern." This polishing pad is designed for similar substrates and features a polishing layer with a polymeric matrix and radial feeder grooves. The grooves extend from the center to the outer edge of the pad, and each polishing region contains non-isosceles trapezoid groove structures. These structures facilitate effective polishing by connecting adjacent radial feeder grooves and forming leg segments.
Career Highlights
John Vu Nguyen is currently employed at Rohm and Haas Electronic Materials CMP Holdings, Inc. His innovative work in the field has positioned him as a key player in the development of advanced polishing techniques for semiconductor manufacturing.
Collaborations
He has collaborated with notable coworkers, including Tony Quan Tran and Jeffrey James Hendron, contributing to various projects and innovations within the company.
Conclusion
John Vu Nguyen's contributions to the field of semiconductor technology through his patents and work at Rohm and Haas Electronic Materials CMP Holdings, Inc. highlight his role as a significant inventor in the industry. His innovative methods continue to advance the efficiency of wafer polishing processes.