Albany, NY, United States of America

John Van Derlofske

This inventor holds 1 USPTO granted patent. Top assignee: Rensselaer Polytechnic Institute. Active years: 2007.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: John Van Derlofske: Innovator in Retinal Measurement Technology

Introduction

John Van Derlofske is a notable inventor based in Albany, NY (US). He has made significant contributions to the field of optical measurement, particularly in the area of retinal flux density. His innovative work has implications for understanding light perception in humans.

Latest Patents

John Van Derlofske holds a patent for a "Retinal flux density meter and method of use." This invention is a system designed to approximate the flux density of light on the human retina. The device features a housing with an opening that allows light to enter. Inside the housing, a baffle replicates a facial cutoff function response for the incoming light. Two detectors are strategically positioned to measure the light within the housing. One detector generates a photopic spectral response function that closely mimics the spectral response of the foveal cones in the retina. The other detector produces a scotopic spectral response function that approximates the response of rods in the retina. A processor connected to the detectors calculates the mesopic flux density of the light based on these spectral response functions. This innovative approach enhances the understanding of light interaction with the human eye.

Career Highlights

John Van Derlofske is affiliated with Rensselaer Polytechnic Institute, where he continues to advance research in optical technologies. His work has garnered attention for its potential applications in various fields, including vision science and optical engineering.

Collaborations

Some of his notable coworkers include Mark S. Rea and John Donovan Bullough. Their collaborative efforts contribute to the ongoing research and development in the field of retinal measurement technologies.

Conclusion

John Van Derlofske's contributions to the field of retinal measurement through his innovative patent demonstrate his commitment to advancing optical science. His work not only enhances our understanding of light perception but also paves the way for future innovations in this critical area.

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