Company Filing History:
Years Active: 2000-2007
Title: Innovations of John T Davlin
Introduction
John T Davlin is a prominent inventor based in Nampa, ID (US). He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on methods that enhance the performance and efficiency of semiconductor devices.
Latest Patents
One of his latest patents is titled "Spin coating for maximum fill characteristic yielding a planarized thin film surface." This innovative method involves spinning a material onto a semiconductor device structure to effectively fill recesses formed in the surface. The technique ensures that the material imparts a substantially planar surface while maintaining a thickness that is less than the depth of the recesses. This allows the surface to remain largely uncovered by the material, which is crucial for the functionality of semiconductor devices.
Career Highlights
John T Davlin is currently employed at Micron Technology Incorporated, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His expertise and innovative approaches have positioned him as a key player in the industry.
Collaborations
Throughout his career, John has collaborated with notable colleagues, including Shawn D Davis and John S Molebash. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
John T Davlin's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of the industry, making significant strides in enhancing semiconductor device performance.