DeKalb, IL, United States of America

John T Bahns

This inventor holds 1 USPTO granted patent. Top assignee: Uchicago Argonne, LLC. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John T Bahns. Retrieved from https://idiyas.com/inventor/john-t-bahns-pbci9npp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: John T Bahns: Innovator in Nanotechnology

Introduction

John T Bahns is a notable inventor based in DeKalb, Illinois. He has made significant contributions to the field of nanotechnology, particularly through his innovative methods for assembling nanomaterials. His work has implications for various applications, including optics, sensing, electronics, and catalysis.

Latest Patents

John T Bahns holds a patent for a "Method for patterning nano particles." This invention provides a simple and inexpensive method to assemble nanomaterials into millimeter lengths. The method can be utilized to generate optical, sensing, electronic, magnetic, and catalytic materials. Additionally, it includes a substrate comprised of fused nanoparticles and a diode made from assembled nanoparticles. He has 1 patent to his name.

Career Highlights

Bahns is associated with UChicago Argonne, LLC, where he continues to advance his research in nanotechnology. His work at this institution has allowed him to explore innovative solutions and contribute to the scientific community.

Collaborations

Throughout his career, John T Bahns has collaborated with esteemed colleagues, including Liaohai Chen and Stephen K Gray. These collaborations have further enriched his research and development efforts in the field.

Conclusion

John T Bahns is a pioneering inventor whose work in nanotechnology is paving the way for future innovations. His contributions are essential in advancing the applications of nanomaterials across various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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