John S. Chapman is a notable inventor based in Lincoln University, PA (US). He holds a total of seven patents, showcasing his contributions to various fields of innovation. His work primarily focuses on methods and compositions that enhance industrial processes.

Latest Patents

One of his latest patents is a method of suspending elemental sulfur in water. This method involves providing water that includes elemental sulfur and hydrogen sulfide, and adding a sulfur suspension additive to effectively suspend the elemental sulfur. The additive can be selected from various compounds, including alkyldiphenyloxide disulfonate or its salts, secondary alcohol ethoxylates, and non-ionic ethylene oxide and/or propylene oxide copolymers.

Another significant patent addresses the control and removal of biofilm on surfaces in contact with aqueous industrial systems. This method includes adding a biofilm-disrupting agent and a biocide to the system, which helps reduce and eliminate biofilm-forming microbes. Additionally, a synergistic composition of polyethyleneimine and an oxidizing biocide is disclosed in this patent.

Career Highlights

Throughout his career, John S. Chapman has worked with prominent companies such as Solenis Technologies, L.P. and Hercules Corporation. His experience in these organizations has contributed to his expertise in developing innovative solutions for industrial applications.

Collaborations

John has collaborated with notable coworkers, including Corinne E. Consalo and Zhaoqing Liu. Their combined efforts have further advanced the research and development of effective industrial solutions.

Conclusion

John S. Chapman is a distinguished inventor whose work has significantly impacted industrial processes through his innovative patents. His contributions continue to influence the field and inspire future advancements.

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