Lincoln, MA, United States of America

John R Linton

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Polaroid Corporation. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John R Linton. Retrieved from https://idiyas.com/inventor/john-r-linton-j77qfs26

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of John R. Linton

Introduction

John R. Linton is a notable inventor based in Lincoln, MA (US). He has made significant contributions to the field of photography, particularly through his innovative patent related to photographic elements and methods. His work has had a lasting impact on the industry.

Latest Patents

Linton holds a patent for a novel diffusion transfer photographic system. This system involves the development of an exposed diffusion transfer photographic film unit using an aqueous alkaline processing composition in the presence of alumina-free titanium dioxide. This innovation enhances the quality and efficiency of photographic processes.

Career Highlights

Throughout his career, John R. Linton has been associated with Polaroid Corporation, a leading company in the photography sector. His expertise and innovative spirit have contributed to the advancement of photographic technology.

Collaborations

Linton has worked alongside talented individuals such as Daniel J. Churella and Wilhelm J. Erdmann. These collaborations have fostered a creative environment that has led to groundbreaking advancements in photographic technology.

Conclusion

John R. Linton's contributions to the field of photography through his innovative patent and collaborations with esteemed colleagues highlight his importance as an inventor. His work continues to influence the industry today.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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