This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1993.
Company Filing History:
Years Active: 1993
Title: The Innovations of John R Lankard Sr
Introduction
John R Lankard Sr is a notable inventor based in Mahopac, NY (US). He has made significant contributions to the field of thin-film conductors through his innovative patent. His work has implications for various applications in electronics and materials science.
Latest Patents
Lankard holds a patent for "Laser-induced chemical vapor deposition of thin-film conductors." This patent focuses on controlling the local environment during the pulsed laser removal of thin film circuit metallurgy. The process changes the nature of the top surfaces, allowing for improved interconnection with LCVD films. The method enhances growth morphologies based on the surface created and the debris generated during the ablation process. By flowing helium across the surface during ablation, Lankard achieves better growth morphologies under the same laser writing conditions. His technique employs a low power laser scan to induce metal deposition without damaging the substrate, followed by intermediate and high power scans to achieve the desired metal thickness.
Career Highlights
Lankard's career is marked by his association with the International Business Machines Corporation (IBM). His work at IBM has allowed him to explore and develop advanced technologies in the field of laser applications and materials engineering.
Collaborations
Throughout his career, Lankard has collaborated with notable colleagues such as Thomas H Baum and Paul B Comita. These collaborations have contributed to the advancement of technology in their respective fields.
Conclusion
John R Lankard Sr is a distinguished inventor whose work in laser-induced chemical vapor deposition has paved the way for advancements in thin-film conductors. His innovative approaches continue to influence the field of electronics and materials science.