Spartanburg, SC, United States of America

John R Damewood

This inventor holds 10 USPTO granted patents, plus 1 CIPO patent. Top assignees: Reeves Brothers, Inc., 3M Innovative Properties Company, Reeves Bros. Inc.. Active years: 1991-1996.


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.6

ph-index = 8

Forward Citations = 248(Granted Patents)


Company Filing History:


Years Active: 1991-1996

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10 patents (USPTO):Explore Patents

Title: Innovations by John R. Damewood

Introduction

John R. Damewood is a notable inventor based in Spartanburg, SC, with a remarkable portfolio of 10 patents. His work primarily focuses on advancements in fabric technology, particularly in applications that enhance safety and performance.

Latest Patents

One of his latest patents is for a fabric containing graft polymer thereon. This invention provides a solution for forming a graft substrate that includes a graft initiator, a catalyst, and components that enhance flame retardancy and yarn integrity while maintaining fabric pliability. Another significant patent involves air bag fabric containing graft polymer, which improves the resistance of air bag materials to fraying and distortion during manufacturing and use. This innovation is crucial for passive restraint systems, ensuring safety and reliability.

Career Highlights

Throughout his career, John R. Damewood has worked with reputable companies such as Reeves Brothers, Inc. and Minnesota Mining and Manufacturing Company. His contributions to these organizations have significantly impacted the development of advanced fabric technologies.

Collaborations

John has collaborated with notable coworkers, including Jill R. Menzel and Bert A. Ross, who have contributed to his innovative projects and advancements in the field.

Conclusion

John R. Damewood's contributions to fabric technology through his patents demonstrate his commitment to innovation and safety in the textile industry. His work continues to influence advancements in materials used for critical applications.

Profile summary based on public USPTO records.
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