This inventor holds 2 USPTO granted patents. Top assignee: Infineon Technologies Ag. Active years: 2002-2003.
Location History:
- Stoneygate, GB (2002)
- Leicester, GB (2003)
Company Filing History:
Years Active: 2002-2003
Title: The Innovations of John Pohl
Introduction
John Pohl is a notable inventor based in Leicester, GB. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work primarily focuses on improving processes related to memory cell fabrication.
Latest Patents
One of John Pohl's latest patents is the "Self-aligned STI process using nitride hard mask." This innovative method utilizes a nitride hard mask to isolate active areas of a DRAM cell. The shallow trench isolation (STI) method involves forming memory cells that comprise deep trenches on a semiconductor wafer. These deep trenches are separated from active areas by a region of substrate. A nitride hard mask is formed over the semiconductor wafer, which is then patterned and etched to remove the substrate region between the deep trenches and active areas, providing shallow trench isolation. An etch chemistry selective to the nitride hard mask is employed in this process.
Another significant patent is the "Method of measuring combined critical dimension and overlay in single step." This invention enhances the precision of measurements in semiconductor manufacturing, ensuring better alignment and quality in the production of memory cells.
Career Highlights
John Pohl is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His expertise and innovative approaches have contributed to the advancement of technologies in the industry.
Collaborations
Throughout his career, John has collaborated with talented individuals such as Tobias Mono and Veit Klee. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
John Pohl's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively, paving the way for future innovations.