Company Filing History:
Years Active: 2005-2008
Title: John Perring: Innovator in Photolithography
Introduction
John Perring is a notable inventor based in Plymouth, GB. He has made significant contributions to the field of photolithography, holding 2 patents that showcase his innovative methods. His work has had a considerable impact on semiconductor manufacturing processes.
Latest Patents
One of John Perring's latest patents is focused on multiple level photolithography. This method involves performing photolithography on a substrate with distinct regions at different levels. The process includes exposing a photoresist through two masks to create patterns in both the lower and upper regions without cross-exposing the areas. This innovative approach enhances the precision and efficiency of photolithography in semiconductor applications.
Career Highlights
Throughout his career, John Perring has worked with prominent companies in the semiconductor industry. He has been associated with X-Fab Semiconductor Foundries AG and Zarlink Semiconductor Limited. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.
Collaborations
John has collaborated with notable professionals in his field, including Brian Martin and John Shannon. These partnerships have fostered a creative environment that has led to the development of innovative solutions in photolithography.
Conclusion
John Perring's contributions to the field of photolithography demonstrate his expertise and commitment to innovation. His patents and career achievements reflect his significant role in advancing semiconductor technology.