The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2005
Filed:
Aug. 30, 2002
Applicants:
Brian Martin, Plymouth, GB;
John Perring, Plymouth, GB;
John Shannon, Plymouth, GB;
Inventors:
Assignee:
Zarlink Semiconductor Limited, Swindon, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/20 ;
U.S. Cl.
CPC ...
Abstract
A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region, and at least said first and second regions are coated with a photoresist, the method comprising: