John P Stirniman

Title: John P Stirniman: Innovator in Wafer Lithography

Introduction

John P Stirniman is a notable inventor based in Beaverton, Oregon, with a focus on advancements in wafer lithography. He holds two patents that contribute significantly to the field of semiconductor manufacturing. His work emphasizes the importance of precision in patterning processes, which are critical for the production of integrated circuits.

Latest Patents

Stirniman's latest patents include innovative systems for proximity correction in wafer lithography. One patent describes a method for computing a pattern function for a polygonal pattern with predetermined face angles. This method involves decomposing the polygon into a set of flashes and computing the pattern function by summing all flashes evaluated at a specific point. The function returns a value indicating whether the point is inside the polygon. Another patent outlines a method for calculating a two-dimensional convolution value for any point on a polygonal pattern. This includes identifying half-plane basis functions, convolving them with a kernel, and storing the results in a look-up table for efficient computation.

Career Highlights

Throughout his career, John P Stirniman has worked with various companies, including Avant! Corporation. His contributions to the field have been recognized for their technical depth and practical applications in semiconductor technology.

Collaborations

Stirniman has collaborated with notable professionals in his field, including Michael L Rieger. These partnerships have fostered innovation and the development of advanced technologies in wafer lithography.

Conclusion

John P Stirniman's work in wafer lithography showcases his commitment to innovation and precision in semiconductor manufacturing. His patents reflect significant advancements that enhance the efficiency and accuracy of lithographic processes.