Holland, MI, United States of America

John P McClure

This inventor holds 1 USPTO granted patent. Top assignees: Woodward Fst, Inc., Woodward, Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John P McClure. Retrieved from https://idiyas.com/inventor/john-p-mcclure

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: John P McClure: Innovator of the Semi-Tubular Vane Air Swirler

Introduction

John P McClure is a notable inventor based in Holland, MI (US). He is recognized for his innovative contributions to the field of air swirler technology. His work has led to the development of a unique patent that enhances the efficiency of air flow systems.

Latest Patents

John P McClure holds a patent for a Semi-tubular vane air swirler. This invention features a deep drawn sheet metal component that includes a first and a second set of semi-tubular vanes. The design incorporates a first and a second portion formed by upsetting the sheet metal in opposing directions, which creates mirrored vane geometry. This innovative approach effectively doubles the open area of the vane, improving air flow efficiency.

Career Highlights

Throughout his career, John has worked with reputable companies such as Woodward Fst, Inc. and Woodward, Inc. His experience in these organizations has contributed to his expertise in the field of air flow technology.

Collaborations

John has collaborated with talented individuals, including Matthew S Anderson and Clark Fraser Paterson. These partnerships have likely enriched his work and led to further advancements in his projects.

Conclusion

John P McClure is a distinguished inventor whose work on the Semi-tubular vane air swirler showcases his innovative spirit and technical expertise. His contributions to air flow technology continue to have a significant impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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