Järfälla, Sweden

John-Oscar Larson

This inventor holds 1 USPTO granted patent. Top assignee: Mycronic Ab. Active years: 2026.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of John-Oscar Larson

Introduction

John-Oscar Larson is a notable inventor based in Järfälla, Sweden. He has made significant contributions to the field of laser technology, particularly in the control of laser beam focus. His innovative approach has led to the development of a unique device that enhances the precision of laser applications.

Latest Patents

John-Oscar Larson holds a patent for a "Device and method for controlling focus of a laser beam." This invention discloses a device, a computer program, a computer-readable medium, and a method for controlling the focus of a laser beam during a micro sweep. The laser beam is directed to an acousto-optic deflector, where acoustic waves are applied. These acoustic waves are varied in frequency over time to adjust the deflection angle of the laser beam, achieving a micro sweep. The method adapts the rate of frequency variation to ensure that the laser beam maintains the desired focus throughout the micro sweep.

Career Highlights

John-Oscar Larson is currently employed at Mycronic AB, where he continues to innovate in the field of laser technology. His work has been instrumental in advancing the capabilities of laser systems, making them more efficient and precise.

Collaborations

Some of his notable coworkers include Pontus Stenstrom and Anders Svensson. Their collaborative efforts contribute to the innovative environment at Mycronic AB, fostering advancements in technology.

Conclusion

John-Oscar Larson's contributions to laser technology exemplify the spirit of innovation. His patent for controlling laser beam focus showcases his expertise and commitment to advancing this field. His work continues to influence the development of precise laser applications.

Profile summary based on public USPTO records.
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