Hong Kong, China

John McArthur

This inventor holds 1 USPTO granted patent. Top assignee: Wik Far East Ltd.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John McArthur. Retrieved from https://idiyas.com/inventor/john-mcarthur-zaoh2xvz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Innovations by John McArthur

Introduction

John McArthur is an inventive mind based in Hong Kong, CN. He has made significant contributions to the field of hair care technology. His innovative approach has led to the development of a unique nozzle attachment for hair dryers.

Latest Patents

John McArthur holds a patent for a nozzle attachment for a hair dryer. This invention features a cylindrical element that connects a flow-directing member to the nozzle of the hair dryer. The flow-directing member is designed to deflect the air coming from the hair dryer at a specific acute angle. Additionally, the flow-directing member is rotatable relative to the cylindrical element. The design includes slanted vanes within the flow-directing member, which interact with the air flow. This interaction causes the flow-directing member to rotate, resulting in a continually varying air flow direction.

Career Highlights

John McArthur is currently associated with Wik Far East Ltd. His work at the company has allowed him to focus on innovative solutions in the hair care industry. His patent reflects his commitment to enhancing user experience through practical design.

Conclusion

John McArthur's contributions to hair dryer technology exemplify the spirit of innovation. His patented nozzle attachment showcases his ability to combine functionality with creativity. This invention not only improves hair drying efficiency but also enhances the overall user experience.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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