This inventor holds 1 USPTO granted patent. Top assignee: Intersil Corporation. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: John Mannine Savidge Neilson: Innovator in Semiconductor Technology
Introduction
John Mannine Savidge Neilson is a notable inventor based in Norristown, PA (US). He has made significant contributions to the field of semiconductor technology, particularly with his innovative patent that addresses edge passivation in semiconductor devices. His work has implications for improving the performance and reliability of silicon semiconductor dies.
Latest Patents
Neilson holds a patent for a "Doubly graded junction termination extension for edge passivation of semiconductor devices." This invention involves a silicon semiconductor die that consists of a heavily doped silicon substrate and an upper layer of doped silicon. The upper layer features an active region with a well region of opposite conductivity type and an edge passivation zone that includes a junction termination extension (JTE) region. The JTE region is characterized by varying dopant density, which is crucial for enhancing the performance of semiconductor devices.
Career Highlights
Neilson is associated with Intersil Corporation, where he has contributed to advancements in semiconductor technology. His work has been instrumental in developing solutions that enhance the efficiency and effectiveness of semiconductor devices. With a focus on innovation, Neilson continues to push the boundaries of what is possible in the field.
Collaborations
Neilson has collaborated with Linda Susan Brush, working together to advance their research and development efforts in semiconductor technology. Their partnership exemplifies the collaborative spirit that drives innovation in the industry.
Conclusion
John Mannine Savidge Neilson is a distinguished inventor whose work in semiconductor technology has made a lasting impact. His patent for edge passivation in semiconductor devices showcases his innovative approach to solving complex challenges in the field. Through his contributions, Neilson continues to shape the future of semiconductor technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile