Company Filing History:
Years Active: 2003-2008
Title: John MacNeil: Innovator in Semiconductor Technology
Introduction
John MacNeil is a notable inventor based in Heath, Great Britain. He has made significant contributions to the field of semiconductor technology, holding a total of three patents. His innovative approaches have paved the way for advancements in dielectric materials and semiconductor devices.
Latest Patents
One of MacNeil's latest patents is a method of forming a substantially closed void. This invention involves depositing a flowable liquid dielectric material to partially fill the space between two structures on a substrate. A surface is then placed to bridge and close the space, allowing the substrate to be inverted while maintaining the bridge. The material flows down to be supported by the surface, which is later removed after the material is set in position.
Another significant patent is related to a dielectric layer for a semiconductor device and the method of producing it. This invention features a low dielectric constant insulating film that exhibits a specific Si-H Fourier Transform Infrared (FTIR) doublet. The method includes depositing a dielectric layer over a substrate and treating it in a hydrogen-containing plasma to achieve the desired characteristics.
Career Highlights
Throughout his career, John MacNeil has worked with several companies, including Trikon Holdings Limited and Aviza Technology Limited. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
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Conclusion
John MacNeil's contributions to semiconductor technology through his patents and career experiences highlight his role as an influential inventor in the field. His innovative methods continue to impact the development of advanced semiconductor devices.