New Windsor, NY, United States of America

John M Walsh

This inventor holds 3 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2012-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John M Walsh. Retrieved from https://idiyas.com/inventor/john-m-walsh-s9v59g8j

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Endwell, NY (US) (2012)
  • New Windsor, NY (US) (2015 - 2016)

Company Filing History:


Years Active: 2012-2016

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3 patents (USPTO):Explore Patents

Title: John M. Walsh: Innovator in Semiconductor Device Preparation

Introduction: John M. Walsh, an accomplished inventor based in New Windsor, NY, has made significant contributions to the field of semiconductor technology. With three patents to his name, he has focused on advancing methods for atom probe tomography, which is crucial for the development of three-dimensional semiconductor devices. His work at International Business Machines Corporation (IBM) emphasizes his role in driving innovation in the tech industry.

Latest Patents: One of Walsh's most notable inventions is a method for atom probe tomography sample preparation for three-dimensional (3D) field effect transistor devices. This innovative method involves measuring capacitance-voltage characteristics to identify Fin structures and utilizes a nanomanipulator probe tip for precision detachment. The Fin structure is subsequently welded to the probe tip using a focused ion beam with controlled voltage, optimizing the process for better results. The technique ensures high-quality sample preparation, which is essential for effective analysis and functionality of semiconductor devices.

Career Highlights: Throughout his career at IBM, John M. Walsh has established himself as a leader in semiconductor research and development. His technical expertise and innovative spirit have led to patents that enhance device performance and manufacturing techniques, significantly influencing the field.

Collaborations: Walsh has collaborated with esteemed colleagues such as Terence Lawrence Kane and Richard Joseph Brodfuehrer. This teamwork exemplifies the collaborative nature of research and innovation at IBM, where sharing knowledge and expertise leads to groundbreaking advancements in technology.

Conclusion: John M. Walsh's contributions to the semiconductor industry through his inventive work reflect a commitment to pushing the boundaries of technology. His patents not only advance the processes involved in semiconductor preparation but also inspire future innovations in the field. As he continues his work at IBM, Walsh remains a vital figure in the evolution of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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