Newton, MA, United States of America

John M Sledziewski

This inventor holds 1 USPTO granted patent. Top assignee: The Whitaker Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John M Sledziewski. Retrieved from https://idiyas.com/inventor/john-m-sledziewski-w6ocz112

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: John M Sledziewski: Innovator in Semiconductor Technology

Introduction

John M Sledziewski is a notable inventor based in Newton, MA (US). He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances the fabrication of semiconductor materials.

Latest Patents

John M Sledziewski holds a patent for "Ultrahigh vacuum deposition of silicon (Si-Ge) on HMIC substrates." This invention presents a method in which semiconductor heterojunction and homojunction materials are selectively formed on silicon pedestals in an HMIC after the high-temperature processing steps in fabricating the HMIC structure are completed. This patent showcases his expertise and commitment to advancing semiconductor technology. He has 1 patent to his name.

Career Highlights

John is associated with The Whitaker Corporation, where he applies his knowledge and skills in semiconductor fabrication. His work at the company has been instrumental in pushing the boundaries of technology in this field.

Collaborations

Throughout his career, John has collaborated with talented individuals such as Matthew F O'Keefe and Timothy Edward Boles. These collaborations have fostered innovation and contributed to the success of various projects.

Conclusion

John M Sledziewski is a distinguished inventor whose work in semiconductor technology has made a lasting impact. His patent and collaborations reflect his dedication to innovation in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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