St. Louis Park, MN, United States of America

John M Heitxinger


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 56(Granted Patents)


Company Filing History:


Years Active: 2000

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of John M Heitxinger

Introduction

John M Heitxinger is a notable inventor based in St. Louis Park, MN (US). He has made significant contributions to the field of chemical processing, particularly in enhancing etching processes. His innovative approach has led to the development of a unique patent that addresses specific challenges in the industry.

Latest Patents

John M Heitxinger holds a patent for a method titled "Direct vapor delivery of enabling chemical for enhanced HF etch process." This invention involves an apparatus and method for the direct delivery of enabling chemical gas from a liquid source, along with HF gas in a hydrogen fluoride/enabling chemical-based cleaning or etching process. The liquid enabling chemical is temperature-controlled to generate a vapor pressure sufficient to operate a mass flow controller at a desired processing pressure without the need for a carrier gas. Prior to entering the process chamber, the enabling chemical gas is pre-mixed with HF and optionally a carrier gas, all supplied at independent flow rates. This innovative control of vapor pressure allows for solvent/HF/carrier mixtures that are unattainable with traditional carrier gas systems, thereby expanding the process space.

Career Highlights

John M Heitxinger is currently employed at FSI International, Inc., where he continues to develop and refine his innovative ideas. His work has been instrumental in advancing the capabilities of etching processes, making them more efficient and effective.

Collaborations

John collaborates with Robert T Fayfield, a fellow professional in the field. Their partnership has contributed to the successful development and implementation of innovative solutions in chemical processing.

Conclusion

John M Heitxinger's contributions to the field of chemical processing through his innovative patent demonstrate his commitment to advancing technology. His work not only enhances existing processes but also opens new avenues for research and development in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…