Laurel, MD, United States of America

John Lynch

This inventor holds 1 USPTO granted patent. Top assignee: The University of Tennessee Research Foundation. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John Lynch. Retrieved from https://idiyas.com/inventor/john-lynch-287atgkm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 58(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Innovations by John Lynch in Plasma Treatment Technology

Introduction

John Lynch is an accomplished inventor based in Laurel, MD (US). He has made significant contributions to the field of plasma treatment technology, particularly in the development of systems designed to enhance the surface properties of continuous substrates.

Latest Patents

Lynch holds a patent for "Treater systems and methods for generating moderate-to-high-pressure." This innovative technology involves continuous-feed plasma treater systems that treat substrates such as webs or films. The system operates by continuously feeding these substrates through an enclosure that utilizes plasma discharge to modify the surface properties in a desirable manner. The enclosure features one or more electrode assemblies that generate plasma discharges at varying working-gas pressures, ranging from moderate pressures (around 10 Torr) to high pressures (approximately one Atmosphere). The electrode assemblies are powered by supplies that can excite them in either an RF resonant excitation mode or a pulsed voltage excitation mode. This method allows for efficient and cost-effective treatment of substrates, resulting in superior surface properties compared to traditional systems.

Career Highlights

John Lynch is affiliated with the University of Tennessee Research Foundation, where he continues to advance his research and development efforts in plasma technology. His work has garnered attention for its innovative approach and practical applications in various industries.

Collaborations

Lynch collaborates with Paul D Spence, contributing to the advancement of their shared research interests in plasma treatment systems.

Conclusion

John Lynch's contributions to plasma treatment technology exemplify the innovative spirit of modern inventors. His work not only enhances substrate treatment processes but also sets a new standard for efficiency and effectiveness in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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