John Lilleland

John Lilleland is a notable inventor based in San Jose, CA, with a focus on advancements in semiconductor processing technology. He holds a total of 4 patents that contribute significantly to the field of plasma reaction chambers.

Latest Patents

Lilleland's latest patents include a "Method of manufacturing assembly for plasma reaction chamber and use thereof." This invention features an electrode assembly designed for processing semiconductor substrates, such as single wafers. The assembly comprises a support member, like a graphite ring, and a silicon showerhead electrode that is a circular disk of uniform thickness. An elastomeric joint connects the support member and the electrode, allowing for movement to accommodate thermal expansion during temperature cycling. This joint can include electrically and/or thermally conductive fillers, and the elastomer is a catalyst-cured polymer stable at high temperatures. Another significant patent is the "Electrode for plasma processes and method for manufacture and use thereof," which shares similar features and benefits in semiconductor processing.

Career Highlights

John Lilleland is currently employed at Lam Research Corporation, where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and effectiveness of plasma reaction chambers.

Collaborations

Lilleland has collaborated with notable colleagues, including Jerome S. Hubacek and William S. Kennedy, contributing to the development of advanced technologies in his field.

Conclusion

John Lilleland's contributions to plasma reaction chamber technology and semiconductor processing are significant, showcasing his expertise and innovative spirit. His patents reflect a commitment to improving manufacturing processes in the semiconductor industry.