Company Filing History:
Years Active: 2002-2004
Title: The Innovative Contributions of John Lang
Introduction
John Lang is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of etching processes, particularly in low capacitance dielectric materials.
Latest Patents
One of John Lang's latest patents is titled "Technique for etching a low capacitance dielectric layer." This patent discloses techniques for etching through a low capacitance dielectric layer in a plasma processing chamber. The method utilizes an etch chemistry that includes nitrogen, oxygen, and a hydrocarbon. By employing this etch chemistry, fast etch rates can be achieved while maintaining profile control and preserving the critical dimensions of the resultant openings, such as vias or trenches, in the low capacitance layer.
Another significant patent is "Convertible hot edge ring to improve low-K dielectric etch." This innovation aims to enhance the etching process for low-K dielectrics, further showcasing Lang's expertise in the field.
Career Highlights
John Lang is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to develop and refine techniques that are crucial for modern semiconductor manufacturing.
Collaborations
Throughout his career, John has collaborated with esteemed colleagues, including Ian J Morey and Susan Ellingboe. These collaborations have contributed to the advancement of technologies in the semiconductor sector.
Conclusion
John Lang's innovative patents and contributions to plasma processing technology highlight his role as a key figure in the semiconductor industry. His work continues to influence the efficiency of etching processes, making significant strides in the field.