Fanwood, NJ, United States of America

John L Zilko


Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 1985-1989

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3 patents (USPTO):Explore Patents

Title: The Innovations of John L. Zilko

Introduction

John L. Zilko is a notable inventor based in Fanwood, NJ (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of semi-insulating films. With a total of 3 patents to his name, Zilko's work has had a lasting impact on the industry.

Latest Patents

Zilko's latest patents include a method of forming III-V semi-insulating films using organo-metallic compounds. This innovative process allows for the production of semi-insulating epitaxial layers of Group III-V based semiconductor compounds through a Metal-Organic Chemical Vapor Deposition (MOCVD) process. His research has achieved resistivities greater than 1.times.10.sup.7 ohm/cm. Another significant patent involves the use of bis arene titanium sources, such as cyclopentadienyl cycloheptatrienyl titanium and bis (benzene) titanium, to produce semi-insulating epitaxial layers of Group III-V based semiconductor compounds.

Career Highlights

Throughout his career, Zilko has worked with prestigious organizations, including AT&T Bell Laboratories and American Telephone and Telegraph Company. His experience in these companies has allowed him to refine his expertise in semiconductor technology and contribute to groundbreaking innovations.

Collaborations

Zilko has collaborated with several talented individuals in his field, including Andrew Gomperz Dentai and Charles H. Joyner, Jr. These collaborations have fostered an environment of innovation and have led to the advancement of semiconductor technologies.

Conclusion

John L. Zilko's contributions to the field of semiconductor technology through his patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and pave the way for future innovations.

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