Pleasant Valley, NY, United States of America

John L Deines


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 59(Granted Patents)


Company Filing History:


Years Active: 1977-1979

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2 patents (USPTO):Explore Patents

Title: John L Deines: Innovator in Semiconductor Technology

Introduction

John L Deines is a notable inventor based in Pleasant Valley, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods that enhance the detection of defects in silicon crystals, which is crucial for improving device yield in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Anodic etching method for the detection of electrically active defects." This innovative process allows for the detection of current-carrying defects or leakage paths in silicon crystals through an anodization process. By selectively etching the crystal surface where electrically active defects are located, the method provides a means to predict the yield of desired semiconductor devices. The process involves exposing selected surface portions of the silicon structure to a hydrofluoric acid solution maintained at a negative potential, leading to the formation of etch pits only at locations overlying the defects.

Another significant patent is the "Process for forming monocrystalline silicon carbide on silicon substrates." This method involves converting a portion of a monocrystalline silicon substrate into a porous silicon substance through anodic treatment. The substrate is then heated in an atmosphere containing hydrocarbon gas, resulting in the formation of a layer of monocrystalline silicon carbide on the silicon substrate. This advancement is vital for the development of high-performance semiconductor devices.

Career Highlights

John L Deines is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of semiconductor technology. His work has had a lasting impact on the industry, particularly in enhancing the reliability and efficiency of semiconductor devices.

Collaborations

Throughout his career, John has collaborated with several talented individuals, including Michael R Poponiak and San-Mei Ku. These collaborations have contributed to the advancement of technology in their respective fields.

Conclusion

John L Deines is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the detection of defects and the formation of high-quality materials. His contributions continue to influence the industry and pave the way for future innovations.

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