Mississauga, Canada

John K Hochu

This inventor holds 1 USPTO granted patent. Top assignee: Dearborn Chemical Company Ltd.. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John K Hochu. Retrieved from https://idiyas.com/inventor/john-k-hochu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Innovations by John K Hochu

Introduction

John K Hochu is a notable inventor based in Mississauga, Canada. He has made significant contributions to the field of paper manufacturing through his innovative patent. His work focuses on improving the efficiency of paper making machines, particularly in the area of pitch control.

Latest Patents

John K Hochu holds a patent for a method of controlling pitch in paper making machine dryer fabrics or equipment. This method involves applying a water-soluble or water-dispersible cationic polymer and a water-soluble or water-dispersible anionic aromatic polymer to the fabrics or equipment that are not in continuous contact with process water. This innovative approach enhances the performance of paper making processes.

Career Highlights

Hochu is associated with Dearborn Chemical Company Ltd., where he applies his expertise in chemical engineering to develop solutions for the paper industry. His work has been instrumental in advancing the technology used in paper manufacturing.

Collaborations

John K Hochu collaborates with David A Aston, leveraging their combined knowledge and skills to drive innovation in their field.

Conclusion

John K Hochu's contributions to the paper manufacturing industry through his innovative patent demonstrate his commitment to enhancing production processes. His work continues to influence the efficiency and effectiveness of paper making technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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