Wilmington, DE, United States of America

John J McEvoy

This inventor holds 2 USPTO granted patents. Top assignee: E.i. Dupont De Nemours and Company. Active years: 2000.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2000

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2 patents (USPTO):Explore Patents

Title: Innovations of John J McEvoy

Introduction

John J McEvoy is a notable inventor based in Wilmington, DE (US). He has made significant contributions to the field of catalysis, particularly through his innovative work with aramid polymers. With a total of 2 patents to his name, McEvoy's inventions have the potential to enhance catalytic processes in various applications.

Latest Patents

One of McEvoy's latest patents is focused on aramid polymer catalyst supports. This catalyst composition includes a p-aramid polymer that supports a catalyst agent. The composition demonstrates improved catalytic activity compared to similar compositions that utilize m-aramid polymer as the support. Furthermore, the invention contemplates the creation of shaped and formed catalyst structures using p-aramid particles and fibers, which can be utilized in various forms such as papers, fabrics, honeycomb, and mats.

Career Highlights

John J McEvoy is currently employed at E.I. DuPont De Nemours and Company, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the understanding and application of catalyst compositions in industrial processes.

Collaborations

Throughout his career, McEvoy has collaborated with esteemed colleagues such as Theodore Augur Koch and Edward William Tokarsky. These collaborations have further enriched his research and development efforts.

Conclusion

In summary, John J McEvoy is a distinguished inventor whose work with aramid polymer catalyst supports has the potential to revolutionize catalytic processes. His contributions to the field are noteworthy and continue to influence advancements in technology.

Profile summary based on public USPTO records.
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