This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: John Igo: Innovator in Semiconductor Processing
Introduction
John Igo is a notable inventor based in Kalispell, MT (US), recognized for his contributions to semiconductor processing technology. He holds a patent that showcases his innovative approach to improving the efficiency of wafer processing in semiconductor chambers.
Latest Patents
John Igo's patent, titled "Wafer immersion in semiconductor processing chambers," introduces a method for processing wafers by submerging them in a liquid. This invention utilizes a camera to capture images of the liquid after a wafer has been removed, allowing for the determination of when the liquid is free of disturbances or contaminants. A neural network is employed to analyze these images and identify any disturbances, such as ripples, bubbles, or contaminants. Once the liquid is deemed ready, the controller initiates the next semiconductor process by submerging the subsequent wafer.
Career Highlights
John Igo is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on enhancing semiconductor processing techniques, contributing to advancements in the field.
Collaborations
John Igo collaborates with his coworker, John Lee Klocke, to further develop innovative solutions in semiconductor technology.
Conclusion
John Igo's contributions to semiconductor processing through his patented technology demonstrate his commitment to innovation in the field. His work at Applied Materials, Inc. continues to influence advancements in semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile