The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Jan. 31, 2022
Applied Materials, Inc., Santa Clara, CA (US);
John L. Klocke, Kalispell, MT (US);
John Igo, Kalispell, MT (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A semiconductor processing chamber may process wafers by submerging the wafers in a liquid. To determine when the liquid is free of disturbances or contaminants and thus ready to receive the next wafer, a camera may be positioned to capture images of the liquid after a wafer has been removed from the liquid. A controller may provide the images of the liquid to a neural network to determine when the liquid is ready based on an output of the neural network. The neural network may be trained to identify disturbances, such as ripples, bubbles, or contaminants in the liquid. The controller may then begin controlling the next semiconductor process and submerge the next wafer.