San Francisco, CA, United States of America

John Hager


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovations of John Hager: Advancements in Surface Metrology

Introduction

John Hager is a notable inventor based in San Francisco, CA. With a focus on improving measurement accuracy for localized features in surface metrology tools, Hager has contributed significantly to the field. He currently holds one patent that showcases his innovative approach to surface measurement technologies.

Latest Patents

Hager's patent, titled "Methods and systems for improved localized feature quantification in surface metrology tools," presents a groundbreaking method for enhancing the accuracy of measurements on semiconductor wafers. This method involves several key steps: first, it performs high order surface fitting to eliminate low-frequency shape components and reduce common signal attenuations. Second, it constructs a two-dimensional localized feature metric (LFM) window applied to the residual image, effectively minimizing artifacts at region boundaries. Third, it calculates metrics from the artifact-reduced image, ensuring reliable measurements. Additionally, this process includes filtering data from localized feature measurements and adjusting filtering behavior according to extreme data sample statistics.

Career Highlights

Throughout his career, John Hager has made significant strides at Kla Tencor Corporation, where his innovative ideas have found a nurturing environment. His work exemplifies a commitment to advancing measurement technologies, particularly within the semiconductor industry.

Collaborations

Hager collaborates with esteemed colleagues, including Haiguang Chen and Jaydeep K. Sinha, who contribute to his projects. Their joint efforts aim to push the boundaries of technology and offer significant improvements in surface metrology tools.

Conclusion

John Hager's inventive spirit and focused approach have led to advancements that enhance measurement accuracy in the semiconductor industry. Through his patent and collaboration with talented professionals, he continues to influence innovations in surface metrology. His work stands as a testament to the impact of dedicated inventors in advancing technology.

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