Cincinnati, OH, United States of America

John H Geer

This inventor holds 2 USPTO granted patents. Top assignee: Fabritec International Corporation. Active years: 1991-1992.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 58(Granted Patents)


Company Filing History:


Years Active: 1991-1992

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2 patents (USPTO):Explore Patents

Title: John H Geer: Innovator in Anti-Static Garment Technology

Introduction

John H Geer is a notable inventor based in Cincinnati, OH (US). He has made significant contributions to the field of garment care, particularly in reducing static buildup during the drycleaning process. With a total of 2 patents to his name, Geer continues to innovate in his field.

Latest Patents

Geer's latest patents include an innovative anti-static garment bag designed to eliminate static buildup in the drycleaning process. This anti-static net garment bag not only serves to protect garments during cleaning but also addresses the common issue of static electricity that can affect clothing. His work in this area demonstrates a commitment to improving the efficiency and effectiveness of drycleaning practices.

Career Highlights

Throughout his career, John H Geer has been associated with Fabritec International Corporation, where he has applied his expertise in garment technology. His role at the company has allowed him to focus on developing solutions that enhance the drycleaning process, making it more effective for both consumers and businesses.

Collaborations

Geer has worked alongside his coworker, Gerald N Rubenstein, contributing to the innovative environment at Fabritec International Corporation. Their collaboration has fostered advancements in garment care technology.

Conclusion

John H Geer is a dedicated inventor whose work in anti-static garment technology has made a significant impact on the drycleaning industry. His innovative solutions continue to enhance garment care practices, showcasing his commitment to improving everyday processes.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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