John H English

Title: John H English: Innovator in Epitaxial Deposition Technology

Introduction

John H English is a notable inventor based in Santa Ynez, CA (US). He has made significant contributions to the field of epitaxial deposition technology. With a total of 2 patents, his work focuses on advanced methods for controlling the deposition of materials at the atomic level.

Latest Patents

John H English's latest patents include a method of controlling multi-species epitaxial deposition. This innovative approach utilizes an integrated dual beam multi-channel optical-based flux monitor. The method involves monitoring atomic absorption of multiple atomic species during the epitaxial deposition process. Light from various sources is passed through a deposition region, allowing for atomic absorption to occur. The light that passes through this region is then compared to light in a reference arm that has not passed through an area of atomic absorption. This comparison enables precise monitoring and control of the deposition of an epitaxial layer.

Career Highlights

Throughout his career, John H English has demonstrated a commitment to advancing technology in his field. His patents reflect a deep understanding of the complexities involved in material deposition processes. His innovative methods have the potential to enhance the efficiency and accuracy of epitaxial layer production.

Collaborations

John has collaborated with esteemed colleagues such as Paul Ruengrit Pinsukanjana and Arthur Charles Gossard. These partnerships have contributed to the development of his groundbreaking technologies.

Conclusion

John H English is a prominent figure in the realm of epitaxial deposition technology. His innovative patents and collaborative efforts highlight his dedication to advancing the field. His work continues to influence the future of material science and engineering.