Company Filing History:
Years Active: 2002
Title: Innovations of John H Anderson Sr in Semiconductor Cleaning Technology.
Introduction
John H Anderson Sr is a notable inventor based in Milpitas, California. He has made significant contributions to the field of semiconductor technology, particularly in the area of wafer cleaning methods. His innovative approach has led to the development of a unique cleaning process that enhances the efficiency of semiconductor manufacturing.
Latest Patents
Anderson holds a patent for an ultra-low particle semiconductor cleaner. This method involves immersing a semiconductor wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The process ensures a substantially particle-free environment adjacent to both the front and back faces while the liquid is being removed. Additionally, the method includes introducing a carrier gas that contains a cleaning enhancement substance. This substance dopes the liquid attached to the wafer, creating a concentration gradient that accelerates the fluid flow off the wafer.
Career Highlights
Anderson's career is marked by his dedication to advancing semiconductor cleaning technologies. He has worked with various teams to refine and implement his innovative cleaning methods. His work has been instrumental in improving the quality and efficiency of semiconductor production processes.
Collaborations
Anderson has collaborated with notable colleagues, including Raj Mohindra and Abhay K Bhushan. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the semiconductor industry.
Conclusion
John H Anderson Sr's contributions to semiconductor cleaning technology exemplify the impact of innovation in the field. His patented methods not only enhance the cleaning process but also contribute to the overall efficiency of semiconductor manufacturing. His work continues to influence the industry and inspire future advancements.