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For the Inventor, By the Inventor

Fishkill, NY, United States of America

John George Hartley

USPTO Granted Patents = 18

Average Co-Inventor Count = 2.0

ph-index = 8

Forward Citations = 150(Granted Patents)


Location History:

  • Dutchess County, NY (US) (1997)
  • Fishkill, NY (US) (1996 - 2004)

Company Filing History:

goldMedal17 out of 164,108 
 
International Business Machines Corporation
 patents
silverMedal1 out of 832,680 
Other
 patents

Years Active: 1996-2004

where 'Filed Patents' based on already Granted Patents

18 patents (USPTO):
1. 6822248 - Spatial phase locking with shaped electron beam lithography (2004-11-23),
2. 6818906 - Electron beam position reference system (2004-11-16),
3. 6614035 - Multi-beam shaped beam lithography system (2003-09-02),
4. 6486953 - Accurate real-time landing angle and telecentricity measurement in lithographic systems (2002-11-26),
5. 6437347 - Target locking system for electron beam lithography (2002-08-20),
6. 6369396 - Calibration target for electron beams (2002-04-09),
7. 6291819 - Method of calibrating an electron beam system for lithography (2001-09-18),
8. 6177680 - Correction of pattern-dependent errors in a particle beam lithography system (2001-01-23),
9. 6091072 - Piece-wise processing of very large semiconductor designs (2000-07-18),
10. 6090528 - Spot-to-spot stitching in electron beam lithography utilizing square (2000-07-18),
11. 5917932 - System and method for evaluating image placement on pre-distorted masks (1999-06-29),
12. 5916716 - Emulation methodology for critical dimension control in E-Beam (1999-06-29),
13. 5838013 - Method for monitoring resist charging in a charged particle system (1998-11-17),
14. 5825039 - Digitally stepped deflection raster system and method of use thereof (1998-10-20),
15. 5798528 - Correction of pattern dependent position errors in electron beam (1998-08-25),

Title: John George Hartley: Pioneering Innovations in Electron Beam Technology

Introduction:

John George Hartley, a prominent inventor based in Fishkill, NY, has made significant contributions to the field of electron beam technology. With an impressive portfolio of 18 patents, Hartley's groundbreaking work has revolutionized the way shaped electron beams are used in lithography processes.

Latest Patents:

Hartley's latest patents showcase his expertise in spatial phase locking with shaped electron beam lithography. By utilizing a dithered shadow pattern within the charged particle beam, he has devised a novel method for precise positioning without the need for intrusive fiducial marks. This innovation allows for real-time phase-locked position correction with unparalleled accuracy, making it ideal for advanced mask-making processes.

Career Highlights:

Throughout his career, Hartley has been a key figure at renowned companies such as IBM, where he has spearheaded research and development initiatives in electron beam technology. His deep expertise in the field has led to the successful implementation of cutting-edge solutions for high-precision lithography applications.

Collaborations:

Hartley has collaborated closely with esteemed colleagues, including William A Enichen and Rodney A Kendall, who have played instrumental roles in his innovative projects. Together, they have pushed the boundaries of electron beam technology, paving the way for new advancements in the industry.

Conclusion:

John George Hartley's unparalleled contributions to electron beam technology have solidified his reputation as a trailblazing inventor in the field. His dedication to precision and innovation continues to inspire future generations of inventors and researchers in the quest for technological excellence.

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